CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS
نویسنده
چکیده
For the Ti-Al-0-C-system it is shown that it is possible to produce good quality deposits of both single-phase TiAlOC or A1203-layers and heterogeneous layers of TiAlOC and A1203 under normal pressure-CVD-conditions using a reaction gas mixture of TiC14, AlC13, H2 and a CO/C02-mixture.
منابع مشابه
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